C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
23/193, 167/320.
C01B 33/154 (2006.01) A61K 8/25 (2006.01) A61Q 11/00 (2006.01) C01B 33/193 (2006.01)
Patent
CA 1228715
ABSTRACT The invention provides a silica base material for dentifrice formulation having a specific surface area by the BET method and by the CTAB method of 5-60 m2/g-anhydride, and having a difference in specific surface area of less than 40 m2/g- anhydride as determined between these two methods. The refractive index of the material is 1.42-1.45. The invention also provides a method for preparation of the silica base material comprising a two stage reaction between alkali metal silicate and hydro- chloric or sulfuric acid in the presence of electrolyte. In the first stage silica is crystallized at a pH of 10.0, and in the second stage the reaction mixture is neutralized by adjust- ing the pH to 8.0-6.5. The ratio of addition of chloride or sulfate ion between the two stages is a least 5:3 and the neutralization is carried out within 30 minutes. Ageing should proceed for at least 10 minutes.
449056
Fushino Tetsuo
Hachijo Akihiro
Ohtsu Shozo
Shinpo Shozo
Ridout & Maybee Llp
Taki Chemical Co. Ltd.
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