H - Electricity – 04 – B
Patent
H - Electricity
04
B
H04B 10/17 (2006.01) C03C 3/097 (2006.01) C03C 4/00 (2006.01) C03C 13/04 (2006.01) H01S 5/30 (2006.01) H01S 3/17 (2006.01)
Patent
CA 2339391
A thulium doped silica based glass capable of supporting lasing activity including Tm3+ as a lasing species disposed in a host composition, including oxides of germanium, silicon and tantalum. The preferred concentration of silicon in the host composition being between 15-25 weight percent. The preferred concentration of germanium in the host composition being between 0.1-1 weight percent. The preferred concentration of tantalum in the host composition is greater than 15 weight percent. The preferred concentration of thulium ions being in the range of 500 - 1000 parts per million by weight.
Divulgation d'un verre à base de silice dopée au thulium pouvant supporter une activité laser, y compris du Tm3+ comme espèce active placée dans une composition hôte comprenant des oxydes de germanium, de silicium et de tantale. La concentration de silicium préférée dans la composition hôte est comprise entre15 et 25 % en masse. La concentration préférée de germanium dans la composition hôte est comprise entre 0,1 et 1 % en masse. La concentration préférée de tantale dans la composition hôte est supérieure à 15 % en masse. La concentration préférée d'ions de thulium est de l'ordre de 500 à 1000 parties par million en masse.
Percival Robert Michael
Wyatt Richard
British Telecommunications Public Limited Company
Gowling Lafleur Henderson Llp
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