Silicon electrodeposition

Details Silicon electrodeposition Silicon electrodeposition

C - Chemistry, Metallurgy

25

D

204/23.5

C25D 3/54 (2006.01) C25D 9/04 (2006.01) F24J 2/48 (2006.01)

Patent

CA 1076515

SILICON ELECTRODEPOSITION ABSTRACT Elemental silicon of utility as a corrosion resistant coating, as an absorber in a solar thermal conversion system, etc. is provided by nonaqueous electrolytic deposition thereof on a cathode body through electrolytic reduction of a silicon halide or haloid silane compound as a solute in a liquid aprotic dipolar organic solvent for the compound by passing therethrough an electrolyzing current, generally at near ambient temperature and near atmospheric pressure yet under cover of an inert gas, and desirably by pulse electrolysis. The electro- plating composition consists essentially of a nonaqueous solvent solution of the anhydrous liquid aprotic dipolar organic solvent, for example propylene carbonate, dimethylformamide, etc., containing the silicon solute, such as illustrated by silicon tetrachloride and trichlorosilane, in an amount providing, or providing by inclusion therewith of a dissociable electrolyte (e.g. tetrabutylammonium perchlorate), an electrical conduc- tivity, generally greater than one m Mho, requisite to reduce the silicon solute.

263406

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