Silicon polishing solution preparation

Details Silicon polishing solution preparation Silicon polishing solution preparation

C - Chemistry, Metallurgy

11

D

149/21

C11D 7/02 (2006.01) C09G 1/18 (2006.01) H01L 21/306 (2006.01)

Patent

CA 1037364

SILICON POLISHING SOLUTION PREPARATION Abstract of the Disclosure An improved process for preparing a polishing solution for use in the chemical-mechanical polishing of silicon comprising copper ni- trate, ammonium fluoride, nitric acid and ammonium nitrate. The lat- ter two components are added to the copper nitrate, the system mixed well and then the ammonium fluoride added. The process eliminates the need for settling, decantation or filtration during solution pre- paration and permits substantially lowered amounts of copper nitrate to be used for silicon polishing. The silicon polishing solution is also described.

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