C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
C09D 183/04 (2006.01) H01B 3/46 (2006.01) H01L 31/0392 (2006.01)
Patent
CA 2543366
A dielectric coating for use on a conductive substrate including a silicone composition of the formula: [RxSiO(4-x)/2]n wherein x=1-4 and wherein R comprises of methyl, or phenyl, or hydrido, or hydroxyl or alkoxy or combination of them (when 1<x<4). R can also comprise other monovalent radicals independently selected from alkyl or aryl groups, arylether, alkylether, alylamide, arylamide, alkylamino and arylamino radicals . The dielectric coating has a network structure. A photovoltaic substrate is also disclosed and includes a conductive material having a dielectric coating disposed on a surface of the conductive material.
La présente invention concerne un revêtement diélectrique destiné à un substrat conducteur incluant une composition aux silicones représentée par la formule [R¿x?SiO(¿4-x?)¿/2?]¿n ?dans laquelle x=1-4, R étant méthyle, phényle, hydrido, hydroxyle ou alcoxy, ou l'une de leurs combinaisons (avec 1<x<4). R peut également représenter d'autres radicaux monovalents choisis parmi les groupes alkyle ou aryle, ou les radicaux aryléther, alkyléther, alylamide, arylamide, alkylamino et arylamino. Ce revêtement pésente une structure réticulée. L'invention concerne également un substrat photovoltaïque comprenant un matériau conducteur dont la surface est garnie d'un revêtement diélectrique.
Katsoulis Dimitris
Suto Michitaka
Dow Corning Corporation
Katsoulis Dimitris
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
Suto Michitaka
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