Silylated benzoic acid derivatives

C - Chemistry – Metallurgy – 07 – F

Patent

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260/154, 260/242

C07F 7/08 (2006.01) C09K 19/04 (2006.01) C09K 19/40 (2006.01)

Patent

CA 2019380

The present invention relates to compounds of the formula (8) Image (8) in which Z is a halogen atom, a cyano group or a hydroxyl group, n is 0, 1 or 2, R' is a radical of the formula R'''-[Si(R*)2]x(CH2)yR""- (9), in which x is the number 0 or 1, y is an integer from 1 to 18, R''' is as defined below, R* is identitical or different, optionally substituted C1- to C18-hydrocarbon or hydrocarbonoxy radicals, R" " is a phenylene or biphenylene radical or a radical of the formula -E-, where E is a divalent radical of the formula -0- or -[Si(R*)2]Z-, and Z is the number 0 or 1, and the compounds contain at least one group of the formula -Si(R*)2- per molecule, and the radical R" is a cholesteryl radical, a radical as defined for R* or a radical of the formula -C6H4-R*, and the preparation and use thereof, for example as dielectrics in display devices, R''' is a C1- to C8-alkyl radical, a radical of the formula R*-[Si(R*)20]v-, where v is an integer having a value of from 1 to 10, or a radical of the formula Image (3), in which w is the number 0 or 1, and L is a cholesteryl radical or a phenyl radical which is optionally substituted by phenyl, halogen, cyano and/or C1- to C4- alkoxy radicals, or, if w = 0, may alternatively be a halogen atom, a cyano radical or a C1-C4-alkoxy radical.

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