C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
31/105, 260/154,
C07F 7/08 (2006.01) C09K 19/04 (2006.01) C09K 19/40 (2006.01)
Patent
CA 2019558
The present invention relates to compounds of the formula Image (8), in which Z is a radical bonded to the benzene ring in the 2-, 3-, 5- or 6-position, namely a halogen atom, a cyano group or a hydroxyl group, n is 0, 1 or 2, R" is a radical of the formula R'''-[Si(R*)2](CH2)yR" "- (9), in which y is an integer from 4 to 18, R''' is as defined below, R* is identitical or different, optionally substituted C1- to C18-hydrocarbon or hydrocarbonoxy radicals, R" " is a radical of the formula -(E)z- which is optionally bonded to the carboxyl group via a phenylene or biphenylene radical, where E is a divalent radical of the formula -O- or -Si(R*)2-, and Z is the number 0 or 1, and the radial R' is a halogen atom, a cyano radical, a cholesteryl radical, a radical as defined for R* or of the formula -C6H4-R**, and R** may have any meaning of R*, with the exception of an n-octyloxy or an n-decyloxy radical, and the preparation and use thereof, for example as dielectics in display devices. R''' is a C1- to C8-alkyl radical, a radical of the formula R*-[Si(R*)2O]v-, where v is an integer having a value of from 1 to 10, or a radical of the formula Image (3), in which w is the number 0 or 1, and L is a cholesteryl radical or a phenyl radical which is optionally substituted by phenyl, halogen, cyano and/or C1- to C4- alkoxy radicals, or, if w = 0, may alternatively be a halogen atom, a cyano radical or a C1-C4-alkoxy radical.
Haas Wolfgang
Haberle Norman
Kreuzer Franz-Heinrich
Winkler Rainer
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Consortium Fur Elektrochemische Industrie Gmbh
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