Skin cleansing bar with low mush

C - Chemistry – Metallurgy – 11 – D

Patent

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Details

C11D 17/00 (2006.01) C11D 1/04 (2006.01) C11D 1/12 (2006.01) C11D 3/20 (2006.01) C11D 10/04 (2006.01)

Patent

CA 2450910

A cleansing bar composition is described comprising an anionic surfactant, a C6 to C18 free fatty acid, and a fatty alcohol having a melting point under about 35 C and optionally a hydrophobic emollient. Useful emolients include triglycerides, hydrocarbons, silicones, fatty esters, and mixtures thereof. Useful anionic surfactants include C8 to C18 alkali metal acyl isethionates. Suitable low melting fatty alcohols include lauryl alcohol, oleyl alcohol, and a mixture thereof. The inventive bars have excellent mush, lather and wear properties.

L'invention concerne une composition de pain dermatologique comprenant un tensio-actif anionique, un acide gras libre C6 à C18, et un alcool gras dont le point de fusion est inférieur à environ 35 ·C et éventuellement un émollient hydrophobe. Les triglycérides, les hydrocarbones, les silicones les esters gras et leurs mélanges, notamment, sont des émollients utiles. Des C8 à C18 acylisethionates métalliques alcalins, notamment, sont des tensio-actifs anioniques utiles. L'alcool laurique, l'alcool oléique et un mélange de ceux-ci, notamment, sont des alcools gras appropriés à faible point de fusion. Les pains dermatologiques selon l'invention présentent d'excellentes propriétés en matière de substances pâteuses, de tolérance et de mousse.

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