Sol-gel preparation of silica or silica-based vitreous films

Details Sol-gel preparation of silica or silica-based vitreous films Sol-gel preparation of silica or silica-based vitreous films

C - Chemistry, Metallurgy

01

B

C01B 33/12 (2006.01) C01B 33/143 (2006.01) C01B 33/154 (2006.01) C23C 18/12 (2006.01)

Patent

CA 2343726

A sol-gel process allowing the preparation, on a substrate, of glassy films of silicon oxide or mixed oxides based on silicon oxide, of thickness above 1 micrometer, generally between 2 and 20 micrometers. They are characterised by absence of defects, and are particularly suitable as waveguides in flat optical devices.

L'invention concerne un procédé sol-gel permettant de préparer, sur un substrat, des films vitreux d'oxyde de silicium ou d'oxydes mélangés à base d'oxyde de silicium, ces films présentant une épaisseur supérieure à 1 micromètre et variant généralement entre 1 et 20 micromètres. Ces films sont en outre caractérisés par leur absence de défauts, ce qui les rend particulièrement aptes à être utilisés comme guides d'ondes dans des dispositifs optiques plats.

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