C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
167/5, 260/290.1
C07F 7/10 (2006.01) A01N 55/00 (2006.01) A01N 55/10 (2006.01) C07F 7/18 (2006.01)
Patent
CA 2028163
A method of treating surfaces in order to eliminate microbial growth by adding an antibacterially effective amount of an organosilicon quaternary ammonium silatrane compound to the surface in order to destroy bacteria and fungi. The preferred organosilicon quaternary ammonium silatrane compound has the formula (see fig. I) wherein R1, R2, R3 and R4, each represent a hydrogen atom or a methyl, ethyl, propyl or butyl radical.
Méthode pour traiter des surfaces afin d'éliminer la croissance microbienne, consistant à appliquer une quantité antibactérienne efficace d'un dérivé du silatrane, de type ammonium quaternaire organosilicié, à la surface pour détruire les bactéries et les champignons. Le dérivé du silatrane, de type ammonium quaternaire organosilicié, répond de préférence à la formule (voir fig. I), dans laquelle R1, R2, R3 et R4 représentent chacun un atome d'hydrogène ou un radical méthyle, éthyle, propyle ou butyle.
Higgs Bruce Stewart
White William Curtis
Dow Corning Corporation
Gowling Lafleur Henderson Llp
Higgs Bruce Stewart
White William Curtis
LandOfFree
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