Solid state imager

G - Physics – 03 – C

Patent

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Details

G03C 7/12 (2006.01) B41M 5/28 (2006.01) G02F 1/1335 (2006.01) G03F 7/00 (2006.01)

Patent

CA 2138529

A filter is formed on a solid state imager by: forming, on the imaging surface of the imager, an adherent layer of a dye-con- taining photoresist composition comprising a photoresist resin and a thermochromic dye, this dye being substantially non-absor- bent of actinic radiation of a first wavelength, but capable, upon heating, of undergoing a thermally-induced color change which renders it absorptive of actinic radiation of the first wavelength; imagewise exposing the adherent layer of dye-containing photo- resist composition to actinic radiation of the first wavelength; removing one of the exposed and unexposed areas of the layer, while leaving the other of the exposed and unexposed areas on the imaging surface, to form a pattern of filter elements; and heat- ing the solid state imager to a temperature and for a time sufficient to cause the dye to undergo its color change, thereby causing the filter elements to become absorptive of radiation of the first wavelength. This process avoids the long exposure times other- wise required when forming filter elements of a color which strongly absorbs the exposing radiation.

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