Solvent developable photoresist film

Details Solvent developable photoresist film Solvent developable photoresist film

G - Physics

03

F

96/191

G03F 7/025 (2006.01) G03F 7/095 (2006.01) G03F 7/26 (2006.01) G03F 7/34 (2006.01) H05K 3/00 (2006.01)

Patent

CA 1298511

TITLE Improved Solvent Developable Photoresist Film ABSTRACT A multi-layer photosensitive film resist (is provided) in which the photosensitive layers (con- sists of) a plurality of layers having different properties, e.g., greater adhesion to a copper surface provided by one layer and greater toughness and (possibly) reduced adhesion to a temporary support provided by the other layer. PD 1722

353841

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