Solvents for photoresist removal

Details Solvents for photoresist removal Solvents for photoresist removal

G - Physics

03

F

149/28

G03F 7/26 (2006.01)

Patent

CA 1279561

ABSTRACT OF THE DISCLOSURE The invention relates to solvent systems which are based on water-soluble amino derivatives and propy- lene glycol components, for removing photoresists. These solvent systems are comprised of (a) from about 10 to 100% by weight of at least one water-soluble amine of the general formula Image in which R1, R2, R3, R4 denote H or alkyl groups n,m denote 0 to 2, and o denotes 1 to 3; and (b) from about 0 to 90% by weight of at least one water-soluble propylene glycol derivative of the general formula Image in which R3, R4 denote H, alkyl or C-alkyl, and P denotes 1 to 3.

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