C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
18/1047, 400/460
C08G 69/48 (2006.01) C08G 69/32 (2006.01) C08J 3/24 (2006.01) C08J 3/28 (2006.01) C08J 5/16 (2006.01) C08J 5/18 (2006.01)
Patent
CA 1145089
ABSTRACT OF THE DISCLOSURE Aromatic polyamide film, having an excellent thermal resistance and a high dielectric breakdown strength, which comprises an aromatic polyamide containing repeating units of the formula [ NH - Ar1 - CO ] or [ NH - Ar1 -NHCO - Ar2 - CO ] and cross-linked with a cross-linking compound having at least one radical selected from R1 - C(R2) = C(R3) - CH2 - , R1 - C(R2) = CR3 - , R1 C(R2) = C(R3) - COO - and R1 - C(R2) = C(R3) - CONH - , or another cross-linking cyanuric or isocyanuric acid compound, by means of heat, ultraviolet rays or electron beam.
331560
Aoki Akihiro
Shimada Keizo
Tamura Yorikazu
Mcfadden Fincham
Teijin Limited
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