Spin drying apparatus

Details Spin drying apparatus Spin drying apparatus

F - Mech Eng,Light,Heat,Weapons

26

B

233/1

F26B 11/18 (2006.01) F26B 5/08 (2006.01) F26B 21/14 (2006.01) G03F 7/16 (2006.01) H01L 21/00 (2006.01)

Patent

CA 1293488

SPIN DRYING APPARATUS ABSTRACT A spin drying apparatus for drying semiconductor wafers wherein the wafers are contacted only at the edge thereof by a plurality of radially extending arms and wherein means is provided for preventing the generation of turbulent air flow by the fan-like effect of the rotation of the arms during the spin drying step and the recontamination of already cleaned and dried wafer surfaces by contaminants stirred up by the operation of the spin drying apparatus itself.

537249

Affiliated with

Also associated with

Rating

Spin drying apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Spin drying apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spin drying apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1267851