Sputtering target for producing electroconductive...

Details Sputtering target for producing electroconductive... Sputtering target for producing electroconductive...

C - Chemistry, Metallurgy

23

C

204/167.5

C23C 14/34 (2006.01) C23C 14/08 (2006.01)

Patent

CA 1337809

A sputtering target for producing electroconductive transparent films, which comprises indium oxide and tin oxide and having such a shape that not less than 80% by weight of the target is present in an erosion area on sputtering, and the process for manufacturing the sputtering target which comprises molding a slurry or a powder mixture containing indium oxide and tin oxide into a molded shape and sintering the molded shape.

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