Sputtering technique for the deposition of indium oxide

Details Sputtering technique for the deposition of indium oxide Sputtering technique for the deposition of indium oxide

C - Chemistry, Metallurgy

23

C

204/96.1

C23C 14/00 (2006.01) C03C 17/245 (2006.01)

Patent

CA 1112601

Abstract of the Invention Consistent properties for indium oxide films deposited by cathode sputtering over a wide range of outgassing conditions are obtained by adjusting the flow rate of oxygen to maintain a constant discharge current while adjusting the flow rate of argon to maintain a constant pressure in the sputtering chamber.

310058

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