Stabilized, aqueous silicon dioxide dispersion

Details Stabilized, aqueous silicon dioxide dispersion Stabilized, aqueous silicon dioxide dispersion

C - Chemistry, Metallurgy

01

B

C01B 33/149 (2006.01) C01B 33/141 (2006.01) C09C 1/30 (2006.01) C09C 3/06 (2006.01)

Patent

CA 2496467

Aqueous dispersion containing silicon dioxide powder, which is stable in a pH range of 2 to 6, which contains a cation-providing compound that is at least partially soluble in this pH range and the zeta potential of which is less than or equal to zero. It is produced by bringing silicon dioxide powder and at least one cation-providing compound into contact whilst moving in an aqueous medium. The dispersion can be used for chemical-mechanical polishing of metal surfaces.

L'invention concerne une dispersion aqueuse contenant de la poudre de dioxyde de silicium, stable dans une plage de pH comprise entre 2 et 6. Cette dispersion contient un composant fournissant des cations au moins partiellement solubles dans cette plage de pH et dont le potentiel zêta est inférieur ou égal à 0. Cette dispersion est produite par la mise en contact de la poudre de dioxyde de silicium et d'au moins un composé fournissant des cations lors de leur déplacement dans un milieu aqueux. Cette dispersion peut être utilisée pour un polissage chimique et mécanique de surfaces métalliques.

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