Stabilized choline base solutions

Details Stabilized choline base solutions Stabilized choline base solutions

C - Chemistry, Metallurgy

09

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134/27

C09K 13/06 (2006.01) C11D 7/32 (2006.01) C23F 1/32 (2006.01) G03F 7/26 (2006.01) G03F 7/32 (2006.01) G03F 7/42 (2006.01) H01L 21/302 (2006.01) H01L 21/306 (2006.01) H01L 21/3213 (2006.01)

Patent

CA 1306660

25640-FF ABSTRACT OF THE DISCLOSURE Solutions of choline base, (2-hydroxyethyl)trimethyl- ammonium hydroxide, in water and/or lower alkanols may be stabilized by the addition of a stabilizing concentration of a formaldehyde source. The stabilized solutions may be used as cleaning solutions, etchants for semiconductors and metal layers, and developers and strippers for positive working photoresists, and for other uses where a metal ion-free base is desired.

542450

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