C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/7
C11D 3/08 (2006.01) C11D 3/12 (2006.01) C11D 17/00 (2006.01)
Patent
CA 1157340
C 592 (R) ABSTRACT OF THE DISCLOSURE The invention pertains to liquid media, in which particulate materials can be stably suspended, e.g. liquid abrasive cleaning compositions. These products can suffer from a shear-stability problem, and according to the invention this problem can be overcome by the inclusion of a low level, e.g. 0.001 - 0.2%, of a hectorite clay.
388031
Brierley John M.
Scott Melvin
Bereskin & Parr
Unilever Plc
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