H - Electricity – 01 – L
Patent
H - Electricity
01
L
341/105, 356/194
H01L 21/68 (2006.01) G03F 9/00 (2006.01)
Patent
CA 1197327
ABSTRACT A step-and-repeat alignment and exposure system is provided with an adjustable holder for holding a main reticle, a main optical unit including a projection lens for produc- ing an image of the main reticle at an image plane, a stage movable along coordinate axes adjacent to the image plane, and a holder rotatably mounted on the stage for holding a semiconductive wafer to be aligned with respect to the image of the main reticle. The system is further provided with an adjustable holder for holding an auxiliary reticle, a single channel auxiliary optical unit including a main objective lens for producing an image of the auxiliary reticle at the image plane, and a reference mark disposed on the stage and aligned with respect to the coordinate axes. The stage may be con- trolled for positioning the reference mark directly beneath either the projection lens or the main objective lens of the single channel auxiliary optical unit so that the images of both the main reticle and the auxiliary reticle may be aligned with respect to the reference mark and, hence, with respect to the coordinate axes, and so that the relative spacing between these images may be determined and checked from time to time. This permits the main optical unit and the auxiliary optical unit to be employed interchangeably in globally and precision region-by-region aligning the semiconductive wafer with respect to the coordinate axes prior to employing the projection lens in the photometric step-and-repeat printing of the image of the main reticle at each of an array of different regions on the semiconductive wafer. The system also includes a light source unit for selectively frontally illuminating the entire field of view of the main objective lens of the single channel auxiliary optical unit with white light not passing through the auxiliary reticle.
371786
Johannsmeier Karl-Heinz
Phillips Edward H.
Optimetrix Corporation
Sim & Mcburney
LandOfFree
Step-and-repeat projection alignment and exposure system... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Step-and-repeat projection alignment and exposure system..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Step-and-repeat projection alignment and exposure system... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1273943