G - Physics – 03 – B
Patent
G - Physics
03
B
95/32.4, 95/31.6
G03B 27/32 (2006.01)
Patent
CA 1181623
ABSTRACT An alignment and exposure system is provided with a main stage for positioning a reference mark or a semicon- ductive wafer directly beneath a projection lens. The reference mark is mounted on the main stage by a substage permitting the reference mark to be positioned in alignment with the axes of motion of the main stage and in a plane parallel to and coincident with the image plane of the projection lens. Selected portions of a reticle disposed above the projection lens on another stage may be illuminated with either exposure or nonexposure light by a controllable light source unit. While employing the projection lens and a first objective lens unit to view images of portions of the reference mark or wafer illuminated by projected images of the illuminated portions of the reticle, the main or other stage may be employed to directly align the wafer with respect to the reticle or the reticle with respect to the reference mark. While employing a second objective lens unit to view images of portions of the wafer illuminated by projected images of a pair of prealignment reticles, the main stage may be employed to align the wafer with respect to those reticles.
442689
Optimetrix Corporation
Sim & Mcburney
LandOfFree
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