G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/031 (2006.01) B29C 67/00 (2006.01) C08G 75/04 (2006.01) G03F 7/00 (2006.01) G03F 7/027 (2006.01)
Patent
CA 2058224
IMPROVED STEREOLITHOGRAPHY METHOD Abstract of the Disclosure An improved stereolithography method for building a three-dimensional article comprising the steps of patternwise curing successive layers of a bath of curable liquid resin formulation until the article has been completely built up,removing the article from the liquid resin bath and then post-curing the article, wherein the liquid resin is a "thiol/nene" formulation comprising: (a) a first compound having a plurality of norbornene groups thereon; (b) a second compound having a plurality of thiol groups therein; and (c) a free radical photoinitiator, the total functionality of the formulation being greater than 4.
Glaser David M.
Jacobine Anthony F.
Rakas Margaret Ann
Loctite Corporation
Ridout & Maybee Llp
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