Stereolithography using vinyl ether-epoxide polymers

G - Physics – 03 – F

Patent

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G03F 7/028 (2006.01) C08G 59/18 (2006.01) C08G 59/68 (2006.01) G03C 9/08 (2006.01) G03F 7/00 (2006.01) G03F 7/027 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2102107

Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing vinyl ether functionalized compounds and epoxy functionalized compounds plus an effective amount of a cationic photoinitiator.

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