C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
400/2005, 402/9
C08F 8/42 (2006.01)
Patent
CA 1275519
ABSTRACT A novel styrene copolymer having a functional group, i.e. silyl group on the para-position of the aromatic ring, useful as a functional polymer, is provided. An effective process for the production thereof comprises contacting a random or block copolymer of p-methylstyrene and .alpha.-methyl-styrene with an organolithium compound to lithiate partly the p-methyl group in the copolymer and then reacting the lithiated copolymer with a silicon compound represented by the general formula (R1) (R2) (R3) SiX wherein R1, R2 and R3 are, same or different, alkyl groups with 2 to 6 carbon atoms, at least one of R1, R2 and R3 being an alkenyl group, and X is a halogen atom. The invention is useful in providing heat resistance qualities in copolymers. The copolymer of the invention can be used in photohardenable paints having to have heat resistance, electron beam-hardenable paints and photosensitive resins for painting plates.
533831
Imai Chihiro
Kato Masayuki
Niwa Tadashi
Taguchi Yoshio
Imai Chihiro
Kato Masayuki
Niwa Tadashi
Riches Mckenzie & Herbert Llp
Taguchi Yoshio
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