C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 319/18 (2006.01) A61K 31/357 (2006.01) A61K 31/36 (2006.01) A61P 29/00 (2006.01) A61P 37/08 (2006.01) A61P 43/00 (2006.01) C07D 317/60 (2006.01) C07D 317/64 (2006.01) C07D 321/00 (2006.01) C07D 321/10 (2006.01) C07D 321/12 (2006.01)
Patent
CA 2435801
Compounds represented by the general formula (|) or salts thereof: (|) wherein m is an integer of 0 to 4; R1, R2, R3, and R4 are each independently hydrogen, substituted or unsubstituted lower alkyl, or the like; R5 is hydroxyl or substituted or unsubstituted lower alkoxy; R6 is hydrogen or halogeno; R7 is hydroxyl, formyl, substituted or unsubstituted lower alkoxy, or the like; and R8 is hydrogen, substituted or unsubstituted lower alkoxy, or the like.
Composés représentés par la formule générale (I) ou leurs sels: (formule I) dans laquelle m est un entier entre 0 et 4; R1, R2, R3 et R4 sont chacun indépendamment hydrogène, alkyle inférieur substitué ou non substitué ou similaire; R5 est hydroxyle ou alcoxy inférieur substitué ou non substitué; R6 est hydrogène ou halogéno; R7 est hydroxyle, formyle, alcoxy inférieur substitué ou non substitué ou similaire; et R8 est hydrogène, alcoxy inférieur substitué ou non substitué ou similaire.
Mohri Shin-Ichiro
Yanagisawa Arata
Yanase Masashi
Goudreau Gage Dubuc
Kyowa Hakko Kogyo Co. Ltd.
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