C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
23/292, 8/87, 16
C01B 15/037 (2006.01) A01N 59/00 (2006.01) A61K 8/22 (2006.01) A61K 8/81 (2006.01) A61K 47/48 (2006.01) A61L 12/08 (2006.01) A61L 12/12 (2006.01) A61L 15/24 (2006.01) A61L 15/46 (2006.01) A61Q 1/06 (2006.01) A61Q 11/00 (2006.01) A61Q 17/00 (2006.01) C01B 15/01 (2006.01) C02F 1/72 (2006.01) C08F 8/00 (2006.01) C08K 3/20 (2006.01) C11D 3/39 (2006.01) C11D 3/395 (2006.01) C11D 17/00 (2006.01)
Patent
CA 2028354
1803/A/C SUBSTANTIALLY ANHYDROUS COMPLEXES OF PVP AND H2O2 ABSTRACT What is provided herein are substantially anhydrous complexes of PVP and H2O2 in molar ratios of between about 2:1 and 1:1, respectively, which corresponds to between about 13% and about 23% by weight H2O2. The complexes of the invention are substantially uniform, free-flowing, fine white powders. The complexes herein are prepared by reacting PVP and H2O2 in substantially the molar ratio predetermined for the complex. In one suitable process for preparing such complexes the reaction is carried out between the reactants in an anhydrous organic solvent such as ethyl acetate. A method is provided herein for reducing the microbial content of surfaces which comprises contacting said surface with a microbiocidal amount of said free-flowing, substantially anhydrous complex of PVP and H2O2.
Garelick Paul
Lieberman Herbert A.
Login Robert B.
Merianos John J.
Gaf Chemicals Corporation
Garelick Paul
Lieberman Herbert A.
Login Robert B.
Merianos John J.
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