C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 477/00 (2006.01) A61K 31/395 (2006.01) C07D 477/20 (2006.01) C07D 519/00 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2117899
2117899 9321186 PCTABS00027 A compound of formula (I), in which R1 is carboxy or protected carboxy, R2 is 1-hydroxyethyl, R3 is methyl, R4 is optionally substituted pyridyl(lower)alkyl, optionally N-substituted 2-oxopiperazin-1-yl-(lower)alkyl, optionally substituted imidazol-1-yl(C2-C3)alkyl, optionally substituted imidazol-5-yl(lower)alkyl, optionally substituted imidazol-2-yl-(lower)alkyl, optionally substituted pyrazol-4-(or 5-)yl(lower)alkyl, optionally substituted pyrazol-1-ylethyl, optionally substituted triazolyl(lower)alkyl, optionally substituted pyrimidinyl(lower)-alkyl, optionally substituted dihydropyrimidinyl(lower)alkyl, or optionally substituted (2,3-dihydroimidazo-[1,2-b]pyrazol-1-yl)ethyl, and R5 is hydrogen or imino-protective group, and pharmaceutically acceptable salts thereof, which have antimicrobial activity.
Hattori Kohji
Matsuda Keiji
Murata Masayoshi
Nakajima Takashi
Tsutsumi Hideo
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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