Substituted amic acid derivatives

Details Substituted amic acid derivatives Substituted amic acid derivatives

C - Chemistry, Metallurgy

07

C

C07C 235/74 (2006.01) A61K 31/195 (2006.01) A61K 31/33 (2006.01) C07C 69/34 (2006.01) C07C 211/27 (2006.01) C07C 211/29 (2006.01) C07C 215/52 (2006.01) C07C 217/60 (2006.01) C07C 233/05 (2006.01) C07C 233/13 (2006.01) C07C 233/18 (2006.01) C07C 235/06 (2006.01) C07D 207/337 (2006.01) C07D 213/38 (2006.01) C07D 213/40 (2006.01) C07D 213/56 (2006.01) C07D 215/12 (2006.01) C07D 215/14 (2006.01) C07D 215/48 (2006.01) C07D 233/64 (2006.01) C07D 263/32 (2006.01) C07D 307/14 (2006.01) C07D 307/52 (2006.01) C07D 30

Patent

CA 2115183

ABSTRACT A compound of the formula (I) or its pharmaceutically acceptable salt or ester: Image (I) wherein each of Image and Image which are the same or different, is an aryl group or a heteroaromatic ring group; A is a C3-8 linear saturated or unsaturated aliphatic hydrocarbon group which may have substituent(s) selected from the group consisting of a lower alkyl group, a hydroxyl group, a lower alkoxy group, a carboxyl group, an aryl group and an aralkyl group; Q is a single bond or a group of the formula -CO-O-, -O-CO-, -CH2CH2-, -CH=CH-, - OCH2-, -SCH2-, -CH2O- or -CH2S-; each of R1, R2, R3 and R4 which are the same or different, is a hydrogen atom, a halogen atom, a lower alkyl group, a hydroxyl group, a lower alkoxy group, or an aryl or heteroaromatic ring group which may have substituent(s) selected from the group consisting of a halogen atom, a lower alkyl group and a lower alkoxy group; each of R5, R6 and R7 which are the same or different, is a hydrogen atom or a lower alkyl group; and R8 is a hydrogen atom, a lower alkyl group, a lower alkenyl group, a lower alkynyl group or an aralkyl group, provided that when Q is a single bond, Image and Image are not simultaneously 4-chlorophenyl groups.

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