C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/578.5, 71/11
C07C 49/76 (2006.01) A01N 25/00 (2006.01)
Patent
CA 1069537
ABSTRACT OF THE DISCLOSURE This invention relates to compounds having the general formula II Image Ia wherein R1 and R2 are the same or different and each represents hydrogen atom or a lower alkyl group, R3 is a lower alkyl group or a chlorine atom and R4 is a lower alkyl group or allyl group with proviso that where R2 is hydrogen atom and R4 is methyl group, if R1 is methyl group in the 2- or 3- position R3 is a lower alkyl group and if R1 is hydrogen atom, R3 is not methyl group. These compounds have excellent plant growth regulating properties. They may be prepared by a Friedel-Craft condensation by reacting a compound of formula IV: Image IIa where x is a halogen atom, with a compound of the formula Va Image IIIa wherein R1, R2, R3 and R4 arc as defined above.
272797
Futatsuya Fumio
Ishida Shuichi
Ito Kensaku
Kurozumi Akira
Yamada Osamu
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