C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/233, 167/260
C07C 235/56 (2006.01) A61K 31/195 (2006.01) C07C 323/63 (2006.01) C07D 257/04 (2006.01)
Patent
CA 1322374
ABSTRACT OF THE DISCLOSURE Disclosed are novel compounds of the general formula I: Image (I) wherein R is hydrogen or lower alkyl; R1 is hydrogen, halogen, trifluoromethyl, lower alkyl or lower alkoxy; Ar is phenyl, E is carboxyl, tetrazolyl, or N-methyltetrazolyl; and B is a carbon-carbon bond; an alkylene group containing one to about seven carbon atoms; an alkylene group containing one to about seven carbon atoms and being either (a) interrupted by an ether linkage, a thioether linkage or a carbon-carbon double bond, or (b) attached to the phenyl ring by an oxygen atom or an unoxidized sulfur atom: an unoxidized sulfur atom or carboxamido. These novel compounds are useful as inhibitors of leukotriene biosynthesis and as antiallergic agents. Pharmacological compositions containing such compounds and synthetic intermediates for preparing such compounds are also disclosed.
562945
Rustad Mark Allan
Scherrer Robert Allan
Riker Laboratories Inc.
Robic
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