Substituted hexatriene derivatives, their preparation and use

C - Chemistry – Metallurgy – 07 – D

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167/179, 260/312

C07D 257/04 (2006.01) A61K 31/00 (2006.01) C07C 175/00 (1985.01)

Patent

CA 1262910

ABSTRACT OF THE DISCLOSURE: Substituted hexatriene derivatives of the formula (I): Image (I) where R1 is methyl, nitrile, C2-C10-ketal, tetrazolyl, -CH2OR2, -CH2NR3R4 or -COR5, where R2 is hydrogen, C1-4- alkyl, C1-20-alkanoyl or unsubstituted benzoyl or benzoyl substituted by methyl, methoxy, halogen or nitro, R3 and R4 are hydrogen, C1-6-alkanoyl or unsubstituted benzoyl or benzoyl substituted by methyl, methoxy, halogen or nitro, and R5 is hydrogen, C1-4-alkyl, halogen, -OR6 or -NR7R8, where R6 is hydrogen, unsubstituted or hydroxyl-substituted C1-6-alkyl, phenyl or aralkyl, and R7 and R8 are hydrogen, unsubstituted or hydroxyl-substituted C1-6-alkyl, phenyl or aralkyl, and, where relevant, their physiologically tolerated salts are descrobed, together with a process for their preparation. These compounds are useful in the topical and systemic therapy of acne, psoriasis and other dermatological disorders associated with pathologically modified keratinization. They may also be used for topical and systemic therapy, and for prophylaxis, of precanceroses and carcinomas of the skin, the mucous membranes and internal organs, as well as for the treatment of rheumatic disorders, especially disorders of an inflammatory or degenerative nature which affect the joints, muscles, sinews and other parts of the locomotor apparatus.

497801

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