C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 211/26 (2006.01) A61K 31/435 (2006.01) A61K 31/495 (2006.01) C07D 211/56 (2006.01) C07D 211/58 (2006.01) C07D 401/02 (2006.01) C07D 401/04 (2006.01)
Patent
CA 2063030
Substituted N-phenylpiperid- ines I (see formula I) (R1 = H, NO2, CN, halogen, C1-C4-alkyl, CF3, OCF3, OH, CH2OH, COOH, CHO, NH-CHO, NH2, CO-NH2, 5-tetrazinyl, R4-O-, R4-O-CH2-, R4-O-CO-, R4-CO-, R4-NH-CO, R4-CO-NH-, R4-SO2-NH-; R2 = H, NO2, halogen, C1-C4-alkyl or R4-O-; (see formula II) (see formula III) (see formula IV) (see formula V) (see formula VI) (see formula VII) (see formula VIII) R4 = C1-C4-alkyl or phenyl which can carry one of the R2 radicals; R5, R6, H or one of the R4 radicals; R7 = one of the R1 radicals; n = 0 or 1; m = 1 or 2; with the proviso that R3 is (see formula IX) only when n is 1, and the optical isomers in the case of optical isomerism, and the physiologically tolerated acid addition salts, are suitable as drugs.
Behl Berthold
Kirchengast Michael
Lubisch Wilfried
Schult Sabine
Basf Aktiengesellschaft
Behl Berthold
Kirchengast Michael
Lubisch Wilfried
Robic
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