Substituted pyrazolyl benzenesulfonamides for the treatment...

C - Chemistry – Metallurgy – 07 – D

Patent

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Details

C07D 417/04 (2006.01) A61K 31/415 (2006.01) A61K 31/44 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) C07D 231/10 (2006.01) C07D 231/54 (2006.01) C07D 401/04 (2006.01) C07D 403/04 (2006.01) C07D 405/04 (2006.01) C07D 409/04 (2006.01) C07D 413/04 (2006.01) C07D 487/04 (2006.01) C07D 491/04 (2006.01) C07D 495/04 (2006.01)

Patent

CA 2277954

The present invention is concerned with tricyclic-substituted pyrazolyl benzenesulfonamides of Formula I Image wherein R1 is phenyl substituted at position 4 with sulfamyl: wherein R2 is selected from C1-C6-haloalkyl, cyano, carboxyl, C1-C6-alkoxycarbonyl, C1-C6-carboxyalkyl, aminocarbonyl, C1-C6-N-alkylaminocarbonyl, N-arylaminocarbonyl, C1-C6-N,N-dialkylaminocarbonyl, C1-C6-N-alkyl-N-arylaminocarbonyl, C3-C7-cycloalkylaminocarbonyl, and C1-C6-hydroxyalkyl; wherein R3 and R4 together form Image wherein m is 2; wherein A is selected from phenyl and five membered heteroaryl; and wherein R6 is one or more radicals selected from halo, C1-C10-alkyl, C1-C6-afkyisulfonyl, C1-C6-haloalkyl. C1-C6-alkoxy. amino and nitro: wherein aryl wherever occuring means phenyl, naphthyl, tetrahydronaphthyl, indane, biphenyl; or a pharmaceutically-acceptable salt thereof.

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