C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A01N 25/32 (2006.01) A01N 35/10 (2006.01) A01N 43/14 (2006.01)
Patent
CA 2095433
2095433 9208719 PCTABS00013 Pyrido[2,3-d]pyrimidin-2,4(1H,3H)-diones are disclosed, having formulas (Ia) and (Ib), in which R1 and R2 stand for H, substituted or unsubstituted alkyl, cycloalkyl; R3 stands for H, substituted or unsubstituted alkyl; R4 stands for H, alkyl, alkoxycarbonyl, (alkylthio)carbonyl, alkoxy(thiocarbonyl), (alkylthio)thiocarbonyl, cyano or aminocarbonyl; or R3 and R4 represent together alkylene, alkenylene or 1,2-phenylene; R5 stands for H, alkyl, cyano, C(O)R7; R6 stands for alkyl, possibly substituted aralkenyl, aryl or hetaryl, CH2R8, alkoxycarbonyl, (alkylthio)carbonyl, alkoxy(thiocarbonyl), (alkylthio)thiocarbonyl, OH, SH, alkoxy, alkylthio, NH2, alkylamino, NHCXR9, NHSO2R10; R5 and R6 represent together substituted alkylene, alkenylene or 1,2-phenylene, which may also contain carbonyl or thiocarbonyl groups; R7 stands for H, alkyl, OH, SH, alkoxy, alkylthio, alkoxycarbonyl, (alkylthio)carbonyl, alkoxy(thiocarbonyl), (alkylthio)thiocarbonyl, NH2 alkylamino, dialkylamino, possibly substituted aryl or arylamino; R8 stands for halogen, OH, SH, alkoxy, alkylthio, alkoxycarbonyl, (alkylthio)carbonyl, alkoxy(thiocarbonyl), (alkylthio)thiocarbonyl or the formula (a); R9 stands for alkyl, halogen alkyl, NR1R2 or OR1; R10 stands for alkyl, substituted or unsubstituted aryl; R11 stands for halogen, OH, SH, alkoxy, alkylthio, alkyl, nitro or amino; X stands for oxygen or sulphur. Also disclosed are the salts of compounds (Ia) and (Ib) that can be used in agriculture and that contain nitrogen or hydroxy substituants, as well as herbicides that contain 2-[4-(hetero)-aryloxy]-phenoxyacetic acid or propionic acid derivates and/or cyclohexenone derivates as active herbicidal substances and substituted pyrido[2,3-d[pyrimidin-2,4(1H, 3H)-diones, as well as the salts of (Ia) or (Ib) as antidotes when acid end groups or basic nitrogen atoms are present.
Hagen Helmut
Landes Andreas
Raatz Peter
Walter Helmut
Basf Aktiengesellschaft
Robic
LandOfFree
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