C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 213/81 (2006.01) A61K 31/44 (2006.01) A61P 25/00 (2006.01)
Patent
CA 2653940
Pyridylamide compounds of Formula: (I); wherein R1 is -C1-4alkyl or saturated monocyclic cycloalkyl; m is 1 or 2; X is N or CH; Y is N or CR3; Ra is -H, -Z-Ar, -CH2NRbRc, -CN, -CO2C1-4alkyl, -CO2H, or -CONRbRc; where Rb and Rc are each independently -H or -C1-4alkyl; and R2 is -H or -Z-Ar; with the proviso that one of X and Y is N and one of Ra and R2 is -Z-Ar; where Z is O or S; and Ar is a phenyl or monocyclic heteroaryl group unsubstituted or substituted with one, two, or three R3 substituents; where each R3 substituent is independently selected from the group consisting of: halo, -C1-4alkyl, -OH1 -OC1-4alkyl, -SC1-4alkyl, -CN, -CONRdRe, and -NO2; where Rd and Re are each independently -H or -C1-4alkyl; are histamine H3 receptor modulators useful in the treatment of histamine H3 receptor-mediated1 diseases.
Certains composés de pyridyl amide substitués faisant l'objet de cette invention sont des modulateurs des récepteurs de l'histamine H3.
Keith John M.
Letavic Michael A.
Ly Kiev S.
Mani Neelakandha S.
Mills John E.
Janssen Pharmaceutica N.v.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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