C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
260/610.5, 260/5
C08G 69/32 (2006.01) C07C 205/11 (2006.01) C08G 69/26 (2006.01)
Patent
CA 1215077
ABSTRACT A class of polyamides comprising recurring units having substituted-quaterphenylene radicals is disclosed. The polymers comprise recurring units of the formula Image wherein each of A and B is a divalent radical, except that B can represent a single bond; R and R1 are each hydrogen, alkyl, aryl, alkaryl or aralkyl; and c is zero or one; and wherein, when c is one, at least one of A and B is a substituted- quaterphenylene radical having the formula Image where each U is a substituent other than hydrogen, each W is hydrogen or a substituent other than hydrogen, each p is an integer from 1 to 3, each X is hydrogen or a substituent other than hydrogen and each r is an integer from 1 to 4, the U, Wp and Xr substitution being sufficient to provide the radical with a non-coplanar molecular configuration; and wherein, when c is zero, A is a substituted-quaterphenylene radical as aforedescribed. The polyamide materials exhibit solubility in select solvents including those of the non-amide type and are character- ized by high electron density substantially cylindrically distributed about the long axis thereof. The molecularly oriented polymers are optically uniaxial and are suited to application in optical filter and other devices where a highly refractive and birefringent polymeric material is desired.
397277
Guadiana Russell A.
Kalyanaraman Palaiyur S.
Polaroid Corporation
Smart & Biggar
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