C - Chemistry – Metallurgy – 09 – B
Patent
C - Chemistry, Metallurgy
09
B
260/168, 96/34,
C09B 29/00 (2006.01) G03C 1/40 (2006.01) G03C 7/00 (2006.01)
Patent
CA 1132979
Abstract of the Disclosure A nondiffusible sulfonamido compound which is alkali-cleavable upon oxidation to release a diffusible photographically useful material, said nondiffusible sulfon- amido compound having the formula: Image wherein (a) R1 is alkyl, aryl sulfamyl, carbamyl, carbonamido, -carbonyl, carbonyloxy or sulfonamido; (b) R2 is alkyl having from 1 to 13 carbon atoms, aryl, or alkylphenyl having from 7 to 12 carbon atoms; (c) R3 and R4 are independently alkyl, or aryl, or R6 and R4, taken together, form a fused carbocyclic or heterocyclic ring; (d) NHSO2PUG represents a sulfonamido group; (e) PUG represents a photographically useful group; and (f) at least one of R1 R2, R3, or R4, or any combination thereof, provides a molecular configuration of such size or shape as to render the compound nondiffusible under alkaline processing conditions, is useful as a redox releaser in photosensitive elements, photographic film units and in processes for transferring and/or retaining a photographic image in color diffusion transfer units. These elements, film units and processes produce retained color images having substantially reduced minimum densities.
326712
Collet Pierre D.
Gerbal Claude F.
Gompf Thomas E.
Eastman Kodak Company
Gowling Lafleur Henderson Llp
LandOfFree
Substituted sulfonamido, compounds, photosensitive elements,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substituted sulfonamido, compounds, photosensitive elements,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substituted sulfonamido, compounds, photosensitive elements,... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-544908