Substituted sulfonylureas, processes for the manufacture of...

C - Chemistry – Metallurgy – 07 – D

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C07D 239/28 (2006.01) A01N 47/36 (2006.01) C07D 239/42 (2006.01) C07D 251/12 (2006.01) C07D 521/00 (2006.01)

Patent

CA 1215983

A B S T R A C T The invention relates to new substituted sulfonylureas of the general formula Image where Image R1 means chlorine, -COOR5, -S(0)n-R6 or R2 means the groups Image or -CH2-C=C-R11 , R3 means hydrogen, C1-C4-alkyl, C1-C4-alkoxy, C1-C4-alkylthio, halogen, halogen-C1-C4-alkyl, halogen-C1-C4-alkoxy, di-C1-C3-alkyl-amino, C1-C3-alkyl-amino or C1-C3-alkoxy-C1-C3-alkoxy, R4 means hydrogen,C1-C4-alkyl, C1-C4-alkoxy, C1-C4-alkylthio, halogen, halogen-C1-C4-alkyl, halogen-C1-C4-alkoxy, di-C1-C3-alkyl-amino, C1-C3-alkyl-amino or C1-C3-alkoxy-C1-C3-alkoxy, Z means -CH= or -N=, R5 means C1-C8-alkyl, C3-C8-cycloalkyl,-C1-C3-alkoxy-C1-C3-alkyl, phenyl, substituted phenyl, benzyl or substituted benzyl, R6 means C1-C6-alkyl or phenyl, R7 means C1-C4-alkyl, R8 means C1-C4-alkyl, R7 and R8 means C3-C4-cycloalkyl, morpholinyl, pyrrolidinyl, piperidyl or piperazinyl, R9 means hydrogen, chlorine, fluorine or C1-C3-alkyl, R10 means hydrogen, chlorine, fluorine, trifluoromethyl or C1-C3-alkyl, R11 means hydrogen, chlorine, fluorine, cyano, C1-C4-alkyl or phenyl, X means oxygen or sulfur and n means 0, 1 or 2. Processes for the manufacture of these compounds as well as agents that contain them and have a herbicidal and plant growth regulating effect.

456735

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