C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/328.9
C07D 333/38 (2006.01)
Patent
CA 1111855
ABSTRACT The invention relates to compounds of the formula Image I wherein R1 is lower alkyl; R2 is hydroxy or lower alkoxy; R3 and R4, which may be the same or different, are lower alkyl or hydrogen; and the pharma- ceutically acceptable salts thereof, as well as to a process for the prepar- ation thereof. These compounds and salts have plasma lipid level lowering properties.
285200
Confalone Pasquale N.
Pizzolato Giacomo
Rouge Marianne
Uskokovic Milan R.
Fetherstonhaugh & Co.
Hoffmann-La Roche Limited
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