C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/254
C07D 239/88 (2006.01) C07D 239/90 (2006.01)
Patent
CA 1134825
RAN 4050/9 ABSTRACT Quinazolin-derivatives of the general formula Image wherein R1 represents lower alkyl, lower cycloalkyl, lower alkoxy, hydroxy, halogen, lower alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, di-(C1-C7)alkyl- N(CH2)n-O-, hydroxy-lower alkoxy, trifluoromethyl, nitro, amino, mono-lower alkylamino or di-lower alkyl- amino, R2 represents hydroxy, lower alkoxy, di-(C1-C7)alkyl-N(CH2)n-O- or di-(C1-C7)alkyl- N(CH2)nNH- and n represents an integer from 2 to 7 and when R2 is hydroxy, salts thereof with pharmaceutically acceptable bases, and when R1 represents amino, mono-lower alkylamino, di-lower alkylamino or di-(C1-C7)alkyl- N(CH2)n-O- and/or R2 represents di-(C1-C7)alkyl-N(CH2)n-O- or di-(C1-C7)alkyl-N(CH2)n-NH-, salts thereof wlth pharma- ceutically acceptable acids are novel and possess valuable anti-allergic properties and, thus, can be used for the treatment or prevention of allergic reactions, such as bronchial asthma. Said compounds and their salts can be prepared according to different processes.
355555
Lemahieu Ronald A.
Nason William C.
Gowling Lafleur Henderson Llp
Hoffmann-La Roche Limited
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