C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 213/72 (2006.01) C07D 213/61 (2006.01) C07D 213/64 (2006.01) C07D 213/73 (2006.01) C07D 213/77 (2006.01) C07D 405/12 (2006.01)
Patent
CA 2183178
Substituted trifluoromethylpyridines of the general formula Ia or Ib Image Ia Image Ib where the substituents have the following meanings: R1 is amino or hydrazino, in the case of Ib additionally chlorine or fluorine; R is halogen; and R3 is C1-C6-alkyl, C2-C6-alkenyl or C2-C6-alkynyl, it being possible for these groups to have attached to them up to 6 halogen atoms, C3-C6-cycloalkyl which can have attached to it up to 3 C1-C3-alkyl radicals, C1-C6-cyanoalkyl, C1-C4-alkoxy-C2-C6-alkyl, 3-oxetanyl, carboxyl-C1-C6-alkyl, C1-C6-alkoxycarbonyl-C1-C6-alkyl, C1-C4-alkoxy-C2-C4-alkoxycarbonyl-C1-C6-alkyl, aminocarbo- nyl-C1-C6-alkyl, C1-C4-alkylaminocarbonyl-C1-C6-alkyl, C1-C4-dialkylaminocarbonyl-C1-C6-alkyl, C2-C4-alkenyl- aminocarbonyl-C1-C6-alkyl, C3-C4-alkynylaminocarbonyl- C1-C6-alkyl, C1-C4-alkyl-C3-C4-alkenylaminocarbonyl- C1-C6-alkyl, C1-C4-alkyl-C3-C4-alkynylaminocarbonyl- C1-C6-alkyl, C3-C6-(.alpha.-alkylalkylidene)iminoxy-C2-C6-alkyl, cyclopropylmethyl, C1-C6-alkylamino, C1-C6-dialkylamino, C1-C6-alkylideneimino- or .alpha.-(C1-C4-alkyl)-C2-C6-alkylid- eneimino; and halogen is fluorine, chlorine, bromine or iodine, and processes for their preparation.
Hamprecht Gerhard
Heistracher Elisabeth
Klintz Ralf
Schafer Peter
Zagar Cyrill
Basf Aktiengesellschaft
Hamprecht Gerhard
Heistracher Elisabeth
Klintz Ralf
Robic
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