C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/255, 260/315
C07C 275/10 (2006.01) C07D 233/32 (2006.01) C07D 233/40 (2006.01) C07D 239/10 (2006.01) D06M 13/432 (2006.01)
Patent
CA 1306257
ABSTRACT They have the formula: Image (I) where either R1 and R2 are identical and represent -CH2R where R = H or a Cl to C4 alkyl group or R1 and R2 together form the -CH2(CR4R4)n-CH2 group where n = 0 or 1, R4 = H or -CH3, R3 = H or -CH2R5 where R5 = H or a Cl to C4 alkyl group. A and A1 are either identical and represent H or A and A1 together form an ethylene, trimethylene or - CH(OCH2R6)-CH(OCH2R6)- radical where R6 = H or a C1 to C4 alkyl group or, when R3 = H, a 1,2 dihydroxy-ethylene group. They are obtained by reacting a disubstituted ethanal Image (II) with a urea ANH-CO-NHA, followed if required by etherification with an alcohol R5CH2OH.
563289
Blanc Alain
Gelabert Antonio
Wilhelm Didier
Riches Mckenzie & Herbert Llp
Societe Francaise Hoechst
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