Substrate having a carbon rich coating

Details Substrate having a carbon rich coating Substrate having a carbon rich coating

G - Physics

11

B

G11B 5/84 (2006.01) G11B 5/64 (2006.01) G11B 5/72 (2006.01) G11B 5/704 (1995.01)

Patent

CA 2167064

The present invention provides a magnetic recording medium that includes a polymeric flexible substrate and a magnetic layer costing thereon, with a binderless carbon rich layer adhered to the magnetic layer. The present invention also provides a process for the plasma deposition of the carbon rich coating onto a substrate comprising the steps of: a) providing a substrate in a vacuum chamber; b) generating carbon rich plasma in the vacuum chamber by injecting a plasma gas suitable to provide a carbon rich coating into an elongated hollow cathode; and providing a sufficient voltage to create ant maintain plasma; and maintaining a vacuum in the vacuum chamber sufficient for the plasma; and c) exposing the substrate to the plasma while the magnetic medium is influenced by a radio frequency bias electrode to accelerate the plasma toward the substrate and deposit the carbon rich coating on the substrate.

La présente invention concerne un support d'enregistrement magnétique qui comprend un substrat flexible polymère et un revêtement magnétique apposé sur celui-ci sous forme de couche, une couche sans liant, riche en carbone, étant collée à la couche magnétique. La présente invention concerne également un procédé de préparation du revêtement riche en carbone par dépôt de plasma sur un substrat et qui consiste à: (a) former un substrat dans une chambre à vide; (b) générer un plasma riche en carbone dans la chambre à vide en injectant un gaz de plasma approprié pour former un revêtement riche en carbone dans une cathode creuse allongée; et produire une tension suffisante pour créer et maintenir le plasma, maintenir un vide suffisant pour le plasma dans la chambre à vide, et (c) exposer le substrat au plasma alors que le support magnétique subit l'influence d'une électrode de polarisation radioélectrique afin d'accélérer le plasma vers le substrat et de déposer le revêtement riche en carbone sur ce substrat.

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