G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/004 (2006.01) G03F 1/00 (2006.01) G03F 7/12 (2006.01)
Patent
CA 2401187
The present invention provides a substrate-engraving-type chromeless phase-shift mask enabling to adopt a manufacturing method which poses no problem in quality, gives a high operating efficiency, and permits arrangement of characters and symbols, and a manufacturing method thereof. The substrate of the invention has a character/ symbol section, on a surface of a transparent substrate, comprising characters and/or symbols engraved in the form of a slit-shaped or lattice-shaped pattern comprising concave grooves only in a prescribed portion corresponding to the characters and/or symbols.
La présente invention permet d'obtenir un masque de déphasage du type à gravure de substrat, ce qui permet d'adopter un procédé de fabrication ne posant aucun problème de qualité, assure une opération très efficace, et permet la disposition des caractères et des symboles, ainsi qu'un procédé de fabrication. Le substrat concerné comporte une section de caractères/symboles, sur une surface de substrat transparent, comprenant des caractères et des symboles gravés sous forme de motif en forme de rainures ou de réseau constitués de sillons concaves, seulement dans la partie prescrite correspondant aux caractères et/ou aux symboles.
Fujimoto Shigekazu
Kurihara Masaaki
Dai Nippon Printing Co. Ltd.
Macrae & Co.
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