Substrate loading apparatus

Details Substrate loading apparatus Substrate loading apparatus

H - Electricity

01

L

H01L 21/68 (2006.01) H01L 21/687 (2006.01) H01L 49/02 (2006.01)

Patent

CA 2364995

The present invention provides apparatus for loading a substrate (65) onto a processing surface (61) in a thin- film processing chamber (60). The apparatus includes a support (66) which cooperates with one or more corresponding apertures (62) in the processing surface so as to be movable between an extended position in which the support can support a substrate (65) above the processing surface (61) , and a retracted position in which the support is flush with or located below the processing surface (61). The support has a number of limbs (64) which extend radially outwardly from a central hub, at an angle relative to the processing surface. The limbs contact the edges of different sized substrates in use so as to support the substrate in a support plane above the central hub and substantially parallel to the processing surface.

Affiliated with

Also associated with

Rating

Substrate loading apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate loading apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate loading apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1592175