Substrate processing apparatus with neg pump

Details Substrate processing apparatus with neg pump Substrate processing apparatus with neg pump

F - Mech Eng,Light,Heat,Weapons

04

B

F04B 37/02 (2006.01) C23C 14/56 (2006.01)

Patent

CA 2236833

An apparatus for processing a substrate includes at least one closed chamber for containing the substrate in a controlled environment, and a non-evaporable gettering material in the chamber acting as an internal pump serving as the primary pumping device for removing contaminants from the controlled environement. In this way the use of expensive and bulky cryogenic pumps can be avoided or minimized.

L'invention porte sur un appareil permettant de traiter un substrat comprenant au moins une enceinte close destinée à renfermer le substrat dans un environnement régulé, et un matériau non évaporable et à effet getter se trouvant dans cette enceinte et se comportant comme une pompe intérieure servant de dispositif de pompage primaire destiné à l'élimination de polluants de l'environnement régulé. Il est possible, de la sorte, soit d'éviter un recours à des pompes cryogéniques coûteuses et volumineuses, soit de réduire leur utilisation à son minimum.

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