C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
204/175
C23C 16/50 (2006.01) C23C 16/509 (2006.01) H01J 37/32 (2006.01)
Patent
CA 1196604
ABSTRACT Apparatus for preventing the deposition of nonhomogeneous semiconductor films onto substrates in a glow discharge deposition system which in- cludes at least one deposition chamber into which process gases are introduced and disassociated by electrodynamic fields created between a cathode and the substrate. The shielding apparatus of the present invention comprises a pair of relatively narrow, elongated shielding plates spacedly dis- posed in the deposition chamber so as to lie sub- stantially parallel to the plane of the substrate, one each disposed adjacent each of the ends of the cathode to block nonhomogeneous films induced by the varied electrodynamic fields which occur at the ends of the cathode from being deposited. In this way, only homogeneous semiconductor films formed by uniform electrodynamic fields produced adjacent the central portion of the cathode are deposited onto the substrate. The shielding plates are preferably coated with a polyimide film to prevent discharge in the area between the shield- ing plates and the substrate.
436881
Hoffman Kevin R.
Nath Prem
Energy Conversion Devices Inc.
Macrae & Co.
LandOfFree
Substrate shield for preventing the deposition of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate shield for preventing the deposition of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate shield for preventing the deposition of... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1329327