Substrate with an organic diffusion barrier layer

C - Chemistry – Metallurgy – 23 – C

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C23C 16/00 (2006.01) B05D 7/24 (2006.01)

Patent

CA 2347829

The invention relates to an organic diffusion barrier layer (58) applied to a substrate (44). Said barrier layer has an apolar skeletal structure and a high barrier effect with respect to volatile gases, vapours and liquids. The diffusion barrier layer (58) consists of a hydrocarbon polymer that is produced by means of plasma polymerization. It respectively contains 0.01-6 at % of at least one element from the group consisting of oxygen, nitrogen, fluorine, bromine, boron and silicon, whereby the total amount of said elements does not exceed 12 at %. The barrier effect of the diffusion barrier layer (58) is produced by means of at least one pulsed or continuous DC magnetron sputtering source plasma (26) or by means of inductively excited, pulsed or continuous microwave discharge (20).

L'invention concerne une couche (58) barrière de diffusion organique appliquée sur un substrat (44). Cette couche barrière de diffusion présente une structure fondamentale apolaire et exerce un effet barrière important contre les gaz, les vapeurs et les liquides très volatils. La couche (58) barrière de diffusion est composée d'un polymère hydrocarbure obtenu par polymérisation plasmatique. Elle comprend à raison de 0,01-6 % at respectivement au moins un des éléments suivants: oxygène, azote, fluor, chlore, brome, bore et silicium, la proportion totale de ces éléments ne dépassant pas 12 % at. Un effet barrière minimal de la couche (58) barrière de diffusion est conservé même dans un environnement d'air humide. On applique cette couche (58) barrière au moyen d'au moins une source (26) pulsée ou continue de plasma de pulvérisation par magnétron CC ou au moyen d'une décharge continue ou pulsée (20) par hyperfréquences, produite par induction.

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