Substrates for phospholipases

Details Substrates for phospholipases Substrates for phospholipases

C - Chemistry, Metallurgy

07

C

260/465.1, 150/3

C07C 305/06 (2006.01) C07C 305/10 (2006.01) C07C 323/12 (2006.01) C07F 9/10 (2006.01) C07F 9/547 (2006.01) C12Q 1/44 (2006.01)

Patent

CA 1337656

The present invention provides phospholipase substrates of the general formula:- Image (I) or Image (II) wherein A is an alkylene or alkenylene radical contain- ing up to 16 carbon atoms, R is a hydrogen atom or an alkyl, alkenyl or acyl radical containing up to 20 carbon atoms or an optionally alkyl-substituted aryl or aralkyl radical containing up to 8 carbon atoms in the alkyl moiety, X is the residue of an aromatic hydroxy or thiol compound and each Y, independently of one another, is an oxygen or sulphur atom and Z is -SO3 ? or a radical of the general formula:- Image wherein R1 can be a hydrogen atom or a radical of the general formula -(CH2)nR?, in which n is 2, 3 or 4 and R2 is a hydrogen atom or a methyl radical, or is an inositol or serine (-CH2-CH(NH2)-COOH) or glycerol residue. The present invention also provides a process for the optical determination of phospholipases using these substrates, as well as a reagent containing them.

590628

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